| 葛正浩1， 杨昊1*， 李理想1， 李杰1， 蔡永礼2.硅片盒喷雾清洗装置设计[J].轻工机械,2024,42(5):10-19 |
| 硅片盒喷雾清洗装置设计 |
| Design of Silicon Wafer Box Spray Cleaning Device |
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| DOI：10.3969/j.issn.1005 2895.2024.05.002 |
| 中文关键词: 硅片盒 喷雾清洗装置 雾化 喷嘴 流体仿真 |
| 英文关键词:silicon wafer box spray cleaning device atomization spray nozzle fluid simulation |
| 基金项目:安徽省科技重大专项项目：面向新一代超声诊疗的高性能MEMS换能器芯片关键技术研究（2022e0302002）。 |
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| 中文摘要: |
| 为减少在半导体产业中因硅片盒洁净度引起的硅片清洗质量问题，提高硅片盒清洗效率并减少化学液用量，课题组设计了一种硅片盒喷雾清洗装置。该装置采用上部喷雾、下部浸入的化学液湿法清洗方式，结合雾化理论对喷嘴结构进行了参数设计，并对化学液喷雾硅片盒清洗机的骨架、槽体和化学液喷雾装置进行建模及仿真分析。研究结果表明：该装置在保证清洗效果的前提下，可以避免因硅片盒洁净度的不足而影响硅片的表面质量，同时减少了化学液的用量和废气的排放。该设计为硅片盒清洗提供了一种更高效且经济的参考方案。 |
| 英文摘要: |
| In order to reduce silicon wafer cleaning quality problems caused by silicon wafer box cleanliness in the semiconductor industry, improve the cleaning efficiency of silicon wafer boxes,and minimize the use of chemical liquid, a silicon wafer box spray cleaning device was designed. The device structure was designed by wet cleaning with upper spray and lower immersion chemical liquid.The design parameters of the spray nozzle structure were calculated based on atomization theory; The skeleton,tank and spray device of chemical liquid silicon wafer box spray cleaning device were modeled and simulated. The research results show that the device can minimize the quantity of chemical liquid and exhaust gas emissions while maintaining the cleaning effect, and prevent wafer surface quality from being impacted by inadequate silicon wafer box cleanliness. This design provides a more efficient and economical reference solution for cleaning silicon wafer boxes . |
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